- 企业类型:贸易商
- 新旧程度:全新
CX51半导体检测显微镜介绍:
工业显微镜广泛应用于半导体,电子工业进行晶体,集成电路的检验和科学研究.配备有反射照明,成象和观察系统,偏光装置.Industrial microscope is widely used for crystal, integrated circuit (IC) examination
polarized imaging system.规格 Specifications 无限远光学系统,管镜焦距200mm Infinitive Optical System, Tube Lens Focal Length 200mm铰链式三目镜筒,30°倾斜, 瞳距55-75mmCompensation Free Trinocular Tube, Inclined at 30°, Interpupillary Distance 55-75mm高眼点,大视场目镜WF10X/22High Point and Wide Field Eyepiece WF10/22长工作距离,平场复消色差物镜
2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42 Long Working Distance, Plan Apo Objectives 2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42五孔物镜转换器Quintuple Nosepiece6″双层活动平台和圆平台6″Double Layers Mechanical Stage and circle stage同轴粗微调焦机构,微动格值0.002mmCoaxial Coarse & Fin Focus Adjustment System, Fine Division 0.002mm照明系统 Illumination System冷光源光纤反射照明器:12V150WCold Light Fiber Reflected Illnminator: 12V150W金相显微镜